NONE NONE application/vnd.ogc.se_xml wet removal Neu scheme tendency DTWR_CH3COCHO wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_ONIT wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z HO2 concentration HO2 HO2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z BENZENE surface flux SFBENZENE BENZENE surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z total inorganic chlorine (Cl+ClO+2Cl2+2Cl2O2+OClO+HOCl+ClONO2+HCl+BrCl) CLOY total inorganic chlorine (Cl+ClO+2Cl2+2Cl2O2+OClO+HOCl+ClONO2+HCl+BrCl) -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z H2O2 concentration H2O2 H2O2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z clox volume mixing ratio CLOX clox volume mixing ratio -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_C2H5OOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3COOH MEGAN emissions flux MEG_CH3COOH CH3COOH MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOGB concentration SOGB SOGB concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOGI concentration SOGI SOGI concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z XO2 concentration XO2 XO2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z total Cl volume mixing ratio TCLY total Cl volume mixing ratio -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_MACROOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Fraction of sfc area covered by land LANDFRAC Fraction of sfc area covered by land -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_ISOPNO3 wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_CH3OOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z EOOH concentration EOOH EOOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Fraction of sfc area covered by ocean OCNFRAC Fraction of sfc area covered by ocean -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z net tendency from chem DHNO3CHM net tendency from chem -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SSLT03 wet deposition SSLT03PP SSLT03 wet deposition -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical loss rate OH_CHML chemical loss rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical production rate OH_CHMP chemical production rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z MEK MEGAN emissions flux MEG_MEK MEK MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z XOH concentration XOH XOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CB2 surface flux SFCB2 CB2 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z POOH concentration POOH POOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z TOLOOH concentration TOLOOH TOLOOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z XYLENE concentration XYLENE XYLENE concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z H concentration H H concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_CH2O deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z O concentration O O concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical loss rate CH4_CHML chemical loss rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Specific humidity Q Specific humidity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Temperature T Temperature -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Zonal wind U Zonal wind -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Meridional wind V Meridional wind -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_ISOPOOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z BIGALD concentration BIGALD BIGALD concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOGM concentration SOGM SOGM concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z BIGALK concentration BIGALK BIGALK concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z lighting insitu NO source LNO_PROD lighting insitu NO source -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SSLT02 wet deposition SSLT02PP SSLT02 wet deposition -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_CH3COOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CB2 optical depth in visible band ODV_CB2 CB2 optical depth in visible band -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CB1 optical depth in visible band ODV_CB1 CB1 optical depth in visible band -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOGX concentration SOGX SOGX concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO concentration CO CO concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH4 concentration CH4 CH4 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_MVK wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOGT concentration SOGT SOGT concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Vertically-integrated mid-level cloud CLDMED Vertically-integrated mid-level cloud -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_C3H7OOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_CH3CN deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3CO3 concentration CH3CO3 CH3CO3 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z PAN concentration PAN PAN concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_CH3OOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z MEKOOH concentration MEKOOH MEKOOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z BENZENE concentration BENZENE BENZENE concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z ENEO2 concentration ENEO2 ENEO2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z density of SOAB SOAB_dens density of SOAB -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SSLT01 wet deposition SSLT01PP SSLT01 wet deposition -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z ISOP concentration ISOP ISOP concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z EO concentration EO EO concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical production rate SOAT_CHMP chemical production rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_CH3CN wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SSLT02 surface flux SFSSLT02 SSLT02 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SSLT01 surface flux SFSSLT01 SSLT01 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SSLT04 surface flux SFSSLT04 SSLT04 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SSLT03 surface flux SFSSLT03 SSLT03 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_MEKOOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z TOLUENE MEGAN emissions flux MEG_TOLUENE TOLUENE MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z ISOP surface flux SFISOP ISOP surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_MACROOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_HYDRALD wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z EO2 concentration EO2 EO2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CB1 surface flux SFCB1 CB1 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3COOH surface flux SFCH3COOH CH3COOH surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical production rate CO_CHMP chemical production rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z HYAC concentration HYAC HYAC concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical loss rate HCN_CHML chemical loss rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z OC1 concentration OC1 OC1 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical loss rate CO_CHML chemical loss rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_CO deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z OC2 concentration OC2 OC2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z H2 concentration H2 H2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z ROOH concentration ROOH ROOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z ALKO2 concentration ALKO2 ALKO2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_XOOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z density of SOAI SOAI_dens density of SOAI -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Vertically-integrated total cloud CLDTOT Vertically-integrated total cloud -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical production rate SOAM_CHMP chemical production rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CRESOL concentration CRESOL CRESOL concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z O3 in bottom layer O3_SRF O3 in bottom layer -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z DMS surface flux SFDMS DMS surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z net tendency from chem DCOCHM net tendency from chem -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Surface latent heat flux LHFLX Surface latent heat flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z HOCH2OO concentration HOCH2OO HOCH2OO concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Surface geopotential PHIS Surface geopotential -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z BIGALK surface flux SFBIGALK BIGALK surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C2H5O2 concentration C2H5O2 C2H5O2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical production rate O3_CHMP chemical production rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_GLYALD wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z OC1 surface flux SFOC1 OC1 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z OC2 surface flux SFOC2 OC2 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z MACRO2 concentration MACRO2 MACRO2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z MACR concentration MACR MACR concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C3H6 concentration C3H6 C3H6 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_ROOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Net longwave flux at surface FLNS Net longwave flux at surface -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Net longwave flux at top of model FLNT Net longwave flux at top of model -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Fraction of sfc area covered by sea-ice ICEFRAC Fraction of sfc area covered by sea-ice -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical loss rate O3_CHML chemical loss rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Grid box averaged cloud ice amount CLDICE Grid box averaged cloud ice amount -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z MPAN concentration MPAN MPAN concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Wet deposition flux at surface OC2SFWET Wet deposition flux at surface -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Grid box averaged cloud liquid amount CLDLIQ Grid box averaged cloud liquid amount -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z TERPO2 concentration TERPO2 TERPO2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Vertical velocity (pressure) OMEGA Vertical velocity (pressure) -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C2H4 MEGAN emissions flux MEG_C2H4 C2H4 MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3COOOH concentration CH3COOOH CH3COOOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C2H6 MEGAN emissions flux MEG_C2H6 C2H6 MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_ALKOOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z photolysis rate jh2o2 photolysis rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical production rate SOAB_CHMP chemical production rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH2O MEGAN emissions flux MEG_CH2O CH2O MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3OOH concentration CH3OOH CH3OOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SO4 concentration SO4 SO4 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_TERPOOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C3H8 concentration C3H8 C3H8 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3O2 concentration CH3O2 CH3O2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C2H6 concentration C2H6 C2H6 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C2H5OH concentration C2H5OH C2H5OH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C2H4 concentration C2H4 C2H4 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z GLYALD concentration GLYALD GLYALD concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C2H2 concentration C2H2 C2H2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z HNO3 concentration HNO3 HNO3 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Surface sensible heat flux SHFLX Surface sensible heat flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_HCN deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z dry deposition flux DF_O3 dry deposition flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOGM column burden TMSOGM SOGM column burden -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z DST02 dust mixing ratio DST02 DST02 dust mixing ratio -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z DST01 dust mixing ratio DST01 DST01 dust mixing ratio -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z density of SOAX SOAX_dens density of SOAX -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_ISOPOOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_CH3COOOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOGB column burden TMSOGB SOGB column burden -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z DST04 dust mixing ratio DST04 DST04 dust mixing ratio -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z DST04 optical depth in visible band ODV_DST04 DST04 optical depth in visible band -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOGI column burden TMSOGI SOGI column burden -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z DST03 dust mixing ratio DST03 DST03 dust mixing ratio -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z DST03 optical depth in visible band ODV_DST03 DST03 optical depth in visible band -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C10H16 surface flux SFC10H16 C10H16 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z DST02 optical depth in visible band ODV_DST02 DST02 optical depth in visible band -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z DST01 optical depth in visible band ODV_DST01 DST01 optical depth in visible band -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_HNO3 deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z RO2 concentration RO2 RO2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_TOLOOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_NO2 deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH2O concentration CH2O CH2O concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Wet deposition flux at surface SOAXSFWET Wet deposition flux at surface -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SSLTA optical depth in visible band ODV_SSLTA SSLTA optical depth in visible band -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Clearsky downwelling solar flux at surface FSDSC Clearsky downwelling solar flux at surface -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SSLTC optical depth in visible band ODV_SSLTC SSLTC optical depth in visible band -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO in bottom layer CO_SRF CO in bottom layer -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical production rate SOAI_CHMP chemical production rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z MEK concentration MEK MEK concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z NH4 concentration NH4 NH4 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SSLT04 progseasalts mixing ratio SSLT04 SSLT04 progseasalts mixing ratio -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SSLT03 progseasalts mixing ratio SSLT03 SSLT03 progseasalts mixing ratio -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SSLT02 progseasalts mixing ratio SSLT02 SSLT02 progseasalts mixing ratio -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3OH surface flux SFCH3OH CH3OH surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SSLT01 progseasalts mixing ratio SSLT01 SSLT01 progseasalts mixing ratio -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z NO concentration NO NO concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z O3 concentration O3 O3 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_HYAC deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Cloud fraction CLOUD Cloud fraction -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO09 surface flux SFCO09 CO09 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_C2H5OOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_MEKOOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z photolysis rate jno2 photolysis rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO05 surface flux SFCO05 CO05 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z OH concentration OH OH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO surface flux SFCO CO surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO06 surface flux SFCO06 CO06 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_MPAN deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO07 surface flux SFCO07 CO07 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO08 surface flux SFCO08 CO08 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO01 surface flux SFCO01 CO01 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO02 surface flux SFCO02 CO02 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO03 surface flux SFCO03 CO03 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z production of SOAT SOAT_PROD production of SOAT -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO04 surface flux SFCO04 CO04 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z ISOPNO3 concentration ISOPNO3 ISOPNO3 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Shortwave cloud forcing SWCF Shortwave cloud forcing -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SSLT04 wet deposition SSLT04PP SSLT04 wet deposition -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z HO2NO2 concentration HO2NO2 HO2NO2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_TERPOOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z photolysis rate jo3_a photolysis rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOGT column burden TMSOGT SOGT column burden -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOGX column burden TMSOGX SOGX column burden -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z MCO3 concentration MCO3 MCO3 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_SO2 wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Surface pressure PS Surface pressure -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C3H7O2 concentration C3H7O2 C3H7O2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_HNO3 wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3COCH3 MEGAN emissions flux MEG_CH3COCH3 CH3COCH3 MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z DST03 surface flux SFDST03 DST03 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z total H2 volume mixing ratio TOTH total H2 volume mixing ratio -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_Pb wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z DST02 surface flux SFDST02 DST02 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z DST04 surface flux SFDST04 DST04 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wetdep of dust (bin2) a2x_DSTWET2 wetdep of dust (bin2) -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wetdep of dust (bin1) a2x_DSTWET1 wetdep of dust (bin1) -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z DST01 surface flux SFDST01 DST01 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wetdep of dust (bin4) a2x_DSTWET4 wetdep of dust (bin4) -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_CH3CHO deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wetdep of dust (bin3) a2x_DSTWET3 wetdep of dust (bin3) -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z PO2 concentration PO2 PO2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Relative humidity RELHUM Relative humidity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z production of SOAI SOAI_PROD production of SOAI -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3CHO MEGAN emissions flux MEG_CH3CHO CH3CHO MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Solar insolation SOLIN Solar insolation -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z net tendency from chem DH2O2CHM net tendency from chem -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z total inorganic bromine (Br+BrO+HOBr+BrONO2+HBr+BrCl) BROY total inorganic bromine (Br+BrO+HOBr+BrONO2+HBr+BrCl) -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z brox volume mixing ratio BROX brox volume mixing ratio -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z production of SOAX SOAX_PROD production of SOAX -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z MEK surface flux SFMEK MEK surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOAT column burden TMSOAT SOAT column burden -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z NH3 surface flux SFNH3 NH3 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z ONITR concentration ONITR ONITR concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3CHO surface flux SFCH3CHO CH3CHO surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3COCH3 surface flux SFCH3COCH3 CH3COCH3 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOAX column burden TMSOAX SOAX column burden -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3OH MEGAN emissions flux MEG_CH3OH CH3OH MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z ISOPOOH concentration ISOPOOH ISOPOOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOAM column burden TMSOAM SOAM column burden -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Downwelling solar flux at surface FSDS Downwelling solar flux at surface -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_CH2O wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C2H5OH surface flux SFC2H5OH C2H5OH surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C2H5OH MEGAN emissions flux MEG_C2H5OH C2H5OH MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z TOLUENE concentration TOLUENE TOLUENE concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z production of SOAM SOAM_PROD production of SOAM -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Longwave heating rate QRL Longwave heating rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z N2O5 concentration N2O5 N2O5 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3COCHO surface flux SFCH3COCHO CH3COCHO surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Solar heating rate QRS Solar heating rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z BIGENE surface flux SFBIGENE BIGENE surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z ISOP MEGAN emissions flux MEG_ISOP ISOP MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z BIGENE MEGAN emissions flux MEG_BIGENE BIGENE MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Water equivalent snow depth SNOWHLND Water equivalent snow depth -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_HO2NO2 deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_CH3COOOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_NH3 wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z TERPOOH concentration TERPOOH TERPOOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z TOLO2 concentration TOLO2 TOLO2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z MACROOH concentration MACROOH MACROOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C3H6 MEGAN emissions flux MEG_C3H6 C3H6 MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3CN concentration CH3CN CH3CN concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Convective cloud cover CONCLD Convective cloud cover -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z NO2 concentration NO2 NO2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C10H16 MEGAN emissions flux MEG_C10H16 C10H16 MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SO2 surface flux SFSO2 SO2 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z NO3 concentration NO3 NO3 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C10H16 concentration C10H16 C10H16 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z dry deposition flux DF_CO dry deposition flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C3H8 MEGAN emissions flux MEG_C3H8 C3H8 MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_HYDRALD deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Large-scale (stable) precipitation rate (liq + ice) PRECL Large-scale (stable) precipitation rate (liq + ice) -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z HCOOH MEGAN emissions flux MEG_HCOOH HCOOH MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Convective precipitation rate (liq + ice) PRECC Convective precipitation rate (liq + ice) -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z HCN concentration HCN HCN concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Wet deposition flux at surface SOAMSFWET Wet deposition flux at surface -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_ROOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z nox volume mixing ratio NOX nox volume mixing ratio -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z noy volume mixing ratio NOY noy volume mixing ratio -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_CH3CHO wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3COOH concentration CH3COOH CH3COOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Wet deposition flux at surface SOABSFWET Wet deposition flux at surface -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z O1D concentration O1D O1D concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SO4 optical depth in visible band ODV_SO4 SO4 optical depth in visible band -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Snow depth over ice SNOWHICE Snow depth over ice -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z ISOPO2 concentration ISOPO2 ISOPO2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOAI column burden TMSOAI SOAI column burden -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z PBL height PBLH PBL height -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_MACR wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOAB column burden TMSOAB SOAB column burden -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C2H5OOH concentration C2H5OOH C2H5OOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Wet deposition flux at surface SOATSFWET Wet deposition flux at surface -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_EOOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_HCOOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_ALKOOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_C2H5OH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_HYAC wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Total Aerosol Optical Depth in visible band AEROD_v Total Aerosol Optical Depth in visible band -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical loss rate N2O_CHML chemical loss rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z dry deposition flux DF_CH2O dry deposition flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z MEKO2 concentration MEKO2 MEKO2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Vertically-integrated high cloud CLDHGH Vertically-integrated high cloud -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_POOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_C3H7OOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_TOLOOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Vertically-integrated low cloud CLDLOW Vertically-integrated low cloud -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z net tendency from chem DO3CHM net tendency from chem -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_HCOOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_H2O2 deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_HO2NO2 wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z BIGALK MEGAN emissions flux MEG_BIGALK BIGALK MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3CN surface flux SFCH3CN CH3CN surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_H2O2 wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z BIGENE concentration BIGENE BIGENE concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Geopotential Height (above sea level) Z3 Geopotential Height (above sea level) -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_CH3COOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z N2O concentration N2O N2O concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Clearsky net solar flux at surface FSNSC Clearsky net solar flux at surface -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z HCN MEGAN emissions flux MEG_HCN HCN MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z HCN surface flux SFHCN HCN surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z HCOOH surface flux SFHCOOH HCOOH surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z TOLUENE surface flux SFTOLUENE TOLUENE surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z XOOH concentration XOOH XOOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical production rate CH2O_CHMP chemical production rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z HYDRALD concentration HYDRALD HYDRALD concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z OC2 optical depth in visible band ODV_OC2 OC2 optical depth in visible band -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical loss rate CH2O_CHML chemical loss rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3CHO concentration CH3CHO CH3CHO concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet deposition tendency OC2WET wet deposition tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z OC1 optical depth in visible band ODV_OC1 OC1 optical depth in visible band -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_C2H5OH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Clearsky net longwave flux at top of model FLNTC Clearsky net longwave flux at top of model -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z lighting column NO source LNO_COL_PROD lighting column NO source -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO08 MEGAN emissions flux MEG_CO08 CO08 MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_DST01 deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Clearsky net solar flux at top of model FSNTC Clearsky net solar flux at top of model -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_DST03 deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical production rate SOAX_CHMP chemical production rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_DST02 deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z density of SOAT SOAT_dens density of SOAT -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_DST04 deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOAB concentration SOAB SOAB concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3COCH3 concentration CH3COCH3 CH3COCH3 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_HCN wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical loss rate H2O2_CHML chemical loss rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Clearsky net longwave flux at surface FLNSC Clearsky net longwave flux at surface -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_NO deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical production rate H2O2_CHMP chemical production rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Wet deposition flux at surface SOAISFWET Wet deposition flux at surface -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO09 concentration CO09 CO09 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO08 concentration CO08 CO08 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO07 concentration CO07 CO07 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO06 concentration CO06 CO06 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO05 concentration CO05 CO05 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO04 concentration CO04 CO04 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z ONIT concentration ONIT ONIT concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO03 concentration CO03 CO03 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO02 concentration CO02 CO02 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO01 concentration CO01 CO01 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Net solar flux at top of model FSNT Net solar flux at top of model -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z NO surface flux SFNO NO surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Net solar flux at surface FSNS Net solar flux at surface -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH3COCHO concentration CH3COCHO CH3COCHO concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z GLYOXAL concentration GLYOXAL GLYOXAL concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C3H8 surface flux SFC3H8 C3H8 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C3H6 surface flux SFC3H6 C3H6 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C3H7OOH concentration C3H7OOH C3H7OOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_ONITR deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z HCOOH concentration HCOOH HCOOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_ONIT deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_ONITR wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_CH3COCHO deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_PAN deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_SSLT03 deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOAI concentration SOAI SOAI concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_SSLT04 deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOAT concentration SOAT SOAT concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_SSLT01 deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_SSLT02 deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z XYLENE surface flux SFXYLENE XYLENE surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOAM concentration SOAM SOAM concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CO MEGAN emissions flux MEG_CO CO MEGAN emissions flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z NH4NO3 concentration NH4NO3 NH4NO3 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CB2 concentration CB2 CB2 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CB1 concentration CB1 CB1 concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z SOAX concentration SOAX SOAX concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_CH3COCH3 deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_EOOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z photolysis rate jpan photolysis rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z MVK concentration MVK MVK concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Wet deposition flux at surface SO4SFWET Wet deposition flux at surface -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z NAT condensed HNO3 HNO3_NAT NAT condensed HNO3 -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH2O surface flux SFCH2O CH2O surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z Rn surface flux SFRn Rn surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C2H6 surface flux SFC2H6 C2H6 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_CH3OH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z CH4 in bottom layer CH4_SRF CH4 in bottom layer -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_XOOH deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical loss rate HNO3_CHML chemical loss rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z ALKOOH concentration ALKOOH ALKOOH concentration -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z chemical production rate HNO3_CHMP chemical production rate -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C2H4 surface flux SFC2H4 C2H4 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z C2H2 surface flux SFC2H2 C2H2 surface flux -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_CH3OH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z wet removal Neu scheme tendency DTWR_POOH wet removal Neu scheme tendency -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z deposition velocity DV_GLYALD deposition velocity -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z production of SOAB SOAB_PROD production of SOAB -1.25 -90.0 358.75 90.0 2010-01-01T00:00:00Z 2010-01-01T00:00:00Z